Hague System Forms

You currently still need to manage some aspects of your international design registrations using downloadable Hague System forms.

For all other actions – including filing your international applications – use eHague.

Send your completed forms to us through our Document Upload Service, using your WIPO Account. Tips! Uploading forms

We are adding more options to eHague all the time! Sign up to Hague System news alerts to stay informed.

Downloadable forms

Description	Download	Latest revision
Make a change in ownership (Form DM/2)		August 2023
Limit protection (Form DM/3)		August 2023
Renounce protection (Form DM/5)		August 2023
Make a change in holder name and/or address (Form DM/6)		April 2022

Important! While you can still perform the following actions using official Hague System forms, we strongly recommend that you use eHague.

Description	Last update
File an international application (Form DM/1) Annex I: Oath or declaration of the creator (United States Patent and Trademark Office) Annex II: Supporting documents – exception to lack of novelty (China National Intellectual Property Administration \| Japan Patent Office \| Korean Intellectual Property Office) Annex III: Information on eligibility for protection (United States Patent and Trademark Office) Annex IV: Reduction of individual designation fee (United States Patent and Trademark Office) Annex V: Supporting document(s) – priority claim (China National Intellectual Property Administration \| Japan Patent Office \| Korean Intellectual Property Office)	April 2024
Renew an international registration (Form DM/4)	April 2024
Appoint a representative (Form DM/7)	April 2022
Make a change in representative name and/or address (Form DM/8)	April 2022
Cancel appointment of a representative (Form DM/9)	April 2022

You can find detailed legal and procedural information on the Hague System in our comprehensive Guide to the Hague System.

Search for country–specific general and legal information on any contracting party in our Hague System Member Profiles.

Avoid common pitfalls when preparing reproductions.

Avoid potential refusals based on unity of design-requirements.